The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Nov. 29, 2022
Promerus, Llc, Akron, OH (US);
Merck Patent Gmbh, Darmstadt, DE;
Oleksandr Burtovyy, Akron, OH (US);
Pawel Miskiewicz, Darmstadt, DE;
Hyun-Jin Yoon, Pyeongtaek-shi, KR;
Patrick Schellin, Darmstadt, DE;
Manuel Hamburger, Darmstadt, DE;
Promerus, LLC, Akron, OH (US);
Merck Patent GmbH, Darmstadt, DE;
Abstract
Embodiments in accordance with the present invention encompass compositions encompassing a latent organo-ruthenium compound, a photosensitizer, one or more monomers which undergo ring open metathesis polymerization (ROMP) and at least two distinct types of UV blockers, where when said composition is exposed to suitable actinic radiation forms a substantially transparent film or a three dimensional object. Surprisingly, the compositions are very stable at ambient conditions to temperatures up to 80° C. for several weeks and undergo mass polymerization only when subjected to actinic radiation under inert atmosphere such as for example a blanket of nitrogen. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as 3D printing materials, coatings, encapsulants, fillers, leveling agents, among others.