The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Apr. 15, 2021
Fina Technology, Inc., Houston, TX (US);
Carlos de Anda, Pearland, TX (US);
Giovanni Trimino, Houston, TX (US);
Bradley Stiles, Houston, TX (US);
Jose Sosa, Deer Park, TX (US);
FINA TECHNOLOGY, INC., Houston, TX (US);
Abstract
A process for producing high impact polystyrene comprising introducing to a reactor a partially-polymerized mixture comprising at least one vinyl aromatic monomer, an elastomer and reacted vinyl aromatic monomer wherein the partially-polymerized mixture has not undergone phase inversion; polymerizing the partially-polymerized mixture in the reactor to the phase inversion point to form a phase-inverted mixture; recovering a portion of the phase-inverted mixture from the reactor wherein the phase-inverted mixture comprises high impact polystyrene; and introducing another portion of the phase-inverted mixture to another reactor.