The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Mar. 25, 2020
Applicant:
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Inventor:
Masayoshi Ueno, Niigata, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07C 253/28 (2006.01);
U.S. Cl.
CPC ...
C07C 253/28 (2013.01);
Abstract
A manufacturing method of a nitrile compound comprising a first step of introducing a raw material gas containing a cyclic compound having an organic substituent, ammonia, and air into a reactor and reacting the raw material gas in the presence of a catalyst to generate the nitrile compound, a second step of discharging a reacted gas from the reactor and separating the nitrile compound from the reacted gas, and a third step of collecting mist from a first residual gas obtained by separating the nitrile compound from the reacted gas to remove water and ammonium carbonate in the first residual gas.