The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2023

Filed:

Nov. 17, 2016
Applicant:

Toray Industries, Inc., Tokyo, JP;

Inventors:

Masao Kamogawa, Otsu, JP;

Mitsuhito Suwa, Otsu, JP;

Hiroko Mitsui, Otsu, JP;

Miki Nakamichi, Otsu, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01G 25/00 (2006.01); H05B 33/22 (2006.01); C08L 85/00 (2006.01); C08G 79/00 (2006.01); C08K 3/22 (2006.01); G02B 1/11 (2015.01); B32B 9/00 (2006.01); H05B 33/28 (2006.01); C07F 7/08 (2006.01); H10K 50/00 (2023.01); G02B 5/28 (2006.01); A61K 51/04 (2006.01);
U.S. Cl.
CPC ...
C01G 25/006 (2013.01); B32B 9/00 (2013.01); C07F 7/0836 (2013.01); C08G 79/00 (2013.01); C08K 3/22 (2013.01); C08L 85/00 (2013.01); G02B 1/11 (2013.01); G02B 5/28 (2013.01); H05B 33/22 (2013.01); H05B 33/28 (2013.01); H10K 50/00 (2023.02); A61K 51/0478 (2013.01);
Abstract

Disclosed is a polymetalloxane including a constituent unit represented by the following general formula (1), which stably exists in a transparent and uniform state in a solution and can form a homogeneous cured film: wherein Ris an organic group and at least one of Ris an (RSiO—) group, Ris optionally selected from specific groups, Ris optionally selected from specific groups, when plural R, R, and Rexist, they may be the same or different, M represents a specific metal atom, m is an integer indicating a valence of a metal atom M, and a is an integer of 1 to (m−2).


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