The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Sep. 29, 2017
Nanyang Technological University, Singapore, SG;
Han Wei Hou, Singapore, SG;
Nishanth Venugopal Menon, Singapore, SG;
Soon Nan Wee, Singapore, SG;
King Ho Holden Li, Singapore, SG;
NANYANG TECHNOLOGICAL UNIVERSITY, Singapore, SG;
Abstract
The present disclosure provides a device for patterning extracellular matrix (ECM) hydrogel comprising a first layer surface patterned to define a microchannel, a second layer comprising a loading channel in fluid communication with loading ports to receive an ECM hydrogel, wherein the first layer is attached over the second layer such that the patterned surface faces the loading channel to define an open chamber with regions of reduced cross-sectional area, and wherein the ECM hydrogel is confined to fill said regions, thereby forming a perfusable channel in the open chamber. The present disclosure also provides the same device wherein the second layer is a substrate without a loading channel and is optically pervious; and additionally provides a method of patterning ECM hydrogel comprising use of the aforementioned device. Importantly, ECM patterning is achieved by surface tension between the ECM hydrogel and the first layer at the boundaries of the microchannel.