The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2023
Filed:
Aug. 20, 2018
Mitsubishi Electric Corporation, Tokyo, JP;
Hitoshi Sakuma, Tokyo, JP;
Mitsubishi Electric Corporation, Tokyo, JP;
Abstract
The present invention is characterized by comprising: forming a stacked structure in which a lower cladding layer, an active layer and an upper cladding layer are stacked on an InP substrate in a shape having a mesa stripe structure; forming a first insulation film on the stacked structure by a sputtering method; forming a second insulation film thinner than the first insulation film, on the first insulation film by a plasma CVD method at a film forming temperature higher than that when the first insulation film has been formed; and forming a first electrode on the upper cladding layer, and forming a second electrode on a back surface of the InP substrate.