The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2023

Filed:

Jul. 07, 2022
Applicant:

Lg Display Co., Ltd., Seoul, KR;

Inventors:

SeungJin Kim, Paju-si, KR;

HeeSung Lee, Incheon, KR;

Sohyung Lee, Goyang-si, KR;

MinCheol Kim, Paju-si, KR;

JeongSuk Yang, Goyang-si, KR;

JeeHo Park, Seoul, KR;

Seoyeon Im, Paju-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 27/12 (2006.01); H01L 29/24 (2006.01); G09G 3/3266 (2016.01); H01L 29/66 (2006.01); H01L 29/417 (2006.01); G09G 3/3291 (2016.01);
U.S. Cl.
CPC ...
H01L 29/7869 (2013.01); G09G 3/3266 (2013.01); H01L 27/1225 (2013.01); H01L 29/24 (2013.01); H01L 29/41733 (2013.01); H01L 29/66969 (2013.01); H01L 29/78696 (2013.01); G09G 3/3291 (2013.01); G09G 2300/0426 (2013.01); G09G 2300/0819 (2013.01); G09G 2300/0842 (2013.01); G09G 2310/0245 (2013.01); G09G 2310/08 (2013.01);
Abstract

Disclosed are a thin film transistor (TFT) including an oxide semiconductor layer capable of being applied to high-resolution flat panel display devices requiring high-speed driving, a gate driver including the TFT, and a display device including the gate driver. The TFT includes first oxide semiconductor layer consisting of indium-gallium-zinc-tin oxide (IGZTO) and a second oxide semiconductor layer including indium-gallium-zinc oxide (IGZO). A content ratio (Ga/In) of gallium (Ga) to indium (In) of the second oxide semiconductor layer is higher than a content (Ga/In) of Ga to In of the first oxide semiconductor layer, and a content ratio (Zn/In) of zinc (Zn) to In of the second oxide semiconductor layer is higher than a content (Zn/In) of Zn to In of the first oxide semiconductor layer.


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