The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2023

Filed:

Sep. 28, 2021
Applicant:

Lapis Semiconductor Co., Ltd., Kanagawa, JP;

Inventor:

Toru Mori, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823892 (2013.01); H01L 21/823814 (2013.01); H01L 21/823857 (2013.01); H01L 29/66659 (2013.01);
Abstract

A semiconductor device, including: a first well of a first polarity formed in a semiconductor substrate; a source region and a drain region of a second polarity formed in the first well so as to be separated from each other by a predetermined spacing; an impurity region of the first polarity formed so as to surround the source region and the drain region; a first gate oxide film formed on the semiconductor substrate at a position between the source region and the drain region; a second gate oxide film formed on the first gate oxide film; a gate electrode formed on the second gate oxide film; and an impurity layer of the first polarity formed below the first gate oxide film.


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