The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2023

Filed:

May. 23, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Takashi Dobashi, Tokyo, JP;

Hirokazu Tamaki, Tokyo, JP;

Hiromi Mise, Tokyo, JP;

Shuntaro Ito, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01); H01J 37/26 (2006.01); H01J 37/02 (2006.01);
U.S. Cl.
CPC ...
H01J 37/02 (2013.01); H01J 37/20 (2013.01); H01J 37/222 (2013.01); H01J 37/244 (2013.01); H01J 37/265 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2817 (2013.01);
Abstract

A charged particle beam apparatus includes a movement mechanism, a particle source, an optical element, a detector, and a control mechanism configured to control, based on an observation condition, the movement mechanism, the particle source, the optical element, and the detector. The control mechanism is configured to acquire a diffraction pattern image including a plurality of Kikuchi lines as a comparison image after inclining the movement mechanism by a first angle, evaluate an error between an inclination angle of the sample and a target inclination angle using a reference image of a reference diffraction pattern and the comparison image, and control inclination of the movement mechanism based on an evaluation result.


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