The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2023
Filed:
Feb. 18, 2021
Sony Group Corporation, Tokyo, JP;
Sony Pictures Entertainment Inc., Culver City, CA (US);
Mengyu Chen, Santa Barbara, CA (US);
Miaoqi Zhu, Studio City, CA (US);
Yoshikazu Takashima, Los Angeles, CA (US);
Ouyang Chao, Torrance, CA (US);
Daniel De La Rosa, Los Angeles, CA (US);
Michael Lafuente, Los Angeles, CA (US);
Stephen Shapiro, Torrance, CA (US);
Sony Group Corporation, Tokyo, JP;
Sony Pictures Entertainment Inc., Culver City, CA (US);
Abstract
Improving the accuracy of predicted segmentation masks, including: extracting a ground-truth RGB image buffer and a binary contour image buffer from a ground-truth RGB image container for segmentation training; generating predicted segmentation masks from the ground-truth RGB image buffer; generating second binary contours from the predicted segmentation masks using a particular algorithm; computing a segmentation loss between manually-segmented masks of the ground-truth RGB image buffer and the predicted segmentation masks; computing a contour accuracy loss between contours of the binary contour image buffer and the binary contours of the predicted segmentation masks; computing a total loss as a weighted average of the segmentation loss and the contour accuracy loss; and generating improved binary contours by compensating the contours of the binary contour image buffer with the computed total loss, wherein the improved binary contours are used to improve the accuracy of the predicted segmentation masks.