The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2023
Filed:
Feb. 28, 2020
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Ryu Komatsu, Atsugi Kanagawa, JP;
Takeharu Motokawa, Zushi Kanagawa, JP;
Noriko Sakurai, Yokohama Kanagawa, JP;
Hideaki Sakurai, Kawasaki Kanagawa, JP;
Assignee:
Kioxia Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/027 (2006.01); G03F 7/00 (2006.01); G03F 7/38 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2041 (2013.01); G03F 7/162 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); G03F 7/70341 (2013.01); H01L 21/0271 (2013.01);
Abstract
A method for processing a substrate includes forming a pattern on a substrate, supplying water to cover the pattern, and after the supplying the water, irradiating the pattern with light having a wavelength longer that which causes dissociation of water. A substrate processing apparatus of an embodiment includes a transfer chamber to receive a patterned substrate, a water supplying chamber to cover the pattern with water, and an irradiating chamber to irradiate a portion of the pattern with near-field light.