The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2023
Filed:
Sep. 27, 2018
Applicant:
Zeon Corporation, Tokyo, JP;
Inventors:
Atsushi Nozawa, Tokyo, JP;
Sadaharu Hashimoto, Tokyo, JP;
Assignee:
ZEON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 290/02 (2006.01); C08F 236/10 (2006.01); C09J 7/35 (2018.01); C08F 230/08 (2006.01); C08K 5/00 (2006.01); C08L 53/02 (2006.01); C08F 290/04 (2006.01);
U.S. Cl.
CPC ...
C08F 236/10 (2013.01); C08F 230/085 (2020.02); C08F 290/044 (2013.01); C08K 5/0016 (2013.01); C08K 5/0025 (2013.01); C08L 53/025 (2013.01); C09J 7/35 (2018.01); C08F 2810/30 (2013.01); C08F 2810/40 (2013.01); C08G 2261/1642 (2013.01); C08L 2205/025 (2013.01); C09J 2453/00 (2013.01);
Abstract
The present invention provides a modified block copolymer composition comprising a modified block copolymer containing at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, and having at least one modified terminal modified with a compound having a silicon atom and an acrylic group and/or a methacrylic group.
Nozawa, Atsushi. (2023). Modified block copolymer composition (U.S. Patent No. 11787891). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11787891
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile