The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Nov. 05, 2021
Applicant:

Melexis Technologies SA, Bevaix, BE;

Inventors:

Appo Van Der Wiel, Tessenderlo, BE;

Yves Bidaux, Bevaix, CH;

Lionel Tombez, Bevaix, CH;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/07 (2006.01); H10N 52/00 (2023.01); H10N 50/80 (2023.01);
U.S. Cl.
CPC ...
H10N 52/101 (2023.02); G01R 33/072 (2013.01); H10N 50/80 (2023.02);
Abstract

A method of producing a semiconductor substrate comprising at least one integrated magnetic flux concentrator, comprising the steps of: a) providing a semiconductor substrate having an upper surface; b) making at least one cavity in said upper surface; c) depositing one or more layers of one or more materials, including sputtering at least one layer of a soft magnetic material; d) removing substantially all of the soft magnetic material that is situated outside of the at least one cavity, while leaving at least a portion of the soft magnetic material that is inside said at least one cavity. A semiconductor substrate comprising at least one integrated magnetic flux concentrator. A sensor device or a sensor system, a current sensor device or system, a position sensor device or system, a proximity sensor device or system, an integrated transformer device or system.


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