The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Jan. 27, 2021
Applicant:

National Chung Cheng University, Chiayi County, TW;

Inventors:

Sheng-Fuh Chang, Chiayi County, TW;

Chia-Chan Chang, Chiayi, TW;

Shih-Cheng Lin, Taitung, TW;

Yuan-Chun Lin, Hsinchu County, TW;

Assignee:

National Chung Cheng University, Chiayi County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 7/145 (2006.01); H01Q 21/06 (2006.01);
U.S. Cl.
CPC ...
H04B 7/145 (2013.01); H01Q 21/062 (2013.01); H01Q 21/065 (2013.01);
Abstract

A system for diffraction of an electromagnetic wave includes a substrate, a transmission unit, and a plurality of antennas. The substrate is made of a second medium. The transmission unit is disposed on the substrate. The transmission unit has a plurality of transmission lines. Each of the transmission lines has a transmission line length that is associated with a first medium operation wavelength that is associated with an operation frequency. The transmission lines are connected successively. The antennas are disposed on the substrate, respectively.


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