The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Jan. 14, 2021
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/503 (2006.01); C30B 25/14 (2006.01); C30B 25/10 (2006.01); C30B 25/12 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32073 (2013.01); C23C 16/503 (2013.01); C30B 25/14 (2013.01); H01J 37/32357 (2013.01); H01J 37/32541 (2013.01); H01J 37/32825 (2013.01); C23C 16/45504 (2013.01); C23C 16/45561 (2013.01); C30B 25/105 (2013.01); C30B 25/12 (2013.01); H01J 37/3244 (2013.01);
Abstract
A substrate processing apparatus includes a reaction chamber including an inlet through which a reaction gas is supplied and an outlet through which residue gas is exhausted; a plurality of ionizers located at a front end of the inlet and configured to ionize the reaction gas supplied through the inlet; and a heater configured to heat the reaction chamber. The plurality of ionizers include a first ionizer configured to ionize the reaction gas positively; and a second ionizer configured to ionize the reaction gas negatively.