The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Jun. 08, 2022
Applicant:

Omron Corporation, Kyoto, JP;

Inventors:

Naoki Kawaguchi, Kyoto, JP;

Takeshi Nishida, Kyoto, JP;

Kazuki Furukawa, Kyoto, JP;

Takashi Tsukada, Kyoto, JP;

Assignee:

OMRON CORPORATION, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01H 50/54 (2006.01); H01H 50/60 (2006.01); H01H 50/58 (2006.01); H01H 50/16 (2006.01); H01H 50/14 (2006.01);
U.S. Cl.
CPC ...
H01H 50/60 (2013.01); H01H 50/14 (2013.01); H01H 50/163 (2013.01); H01H 50/58 (2013.01); H01H 2205/002 (2013.01);
Abstract

An electromagnetic relay includes a case, a first fixed terminal including a first fixed contact, a second fixed terminal including a second fixed contact, a movable contact piece including first and second movable contacts, a first magnet, a gas flow path, and a partition member. The case includes an accommodation space and a side wall covering the accommodation space in a first direction. The accommodation space includes a first space where the first fixed contact is disposed and a second space where the second fixed contact is disposed. The first magnet configured to extend a first arc generated between the first fixed contact and the first movable contact in the first direction. The gas flow path is disposed between the side wall and the movable contact piece. The gas flow path includes an inlet communicating with the first space and an outlet communicating with the second space.


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