The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Oct. 01, 2021
Nec Laboratories America, Inc., Princeton, NJ (US);
Yuncong Chen, Plainsboro, NJ (US);
Zhengzhang Chen, Princeton Junction, NJ (US);
Cristian Lumezanu, Princeton Junction, NJ (US);
Masanao Natsumeda, Princeton Junction, NJ (US);
Xiao Yu, Princeton, NJ (US);
Wei Cheng, Princeton Junction, NJ (US);
Takehiko Mizoguchi, West Windsor, NJ (US);
Haifeng Chen, West Windsor, NJ (US);
Abstract
A method for system metric prediction and influential events identification by concurrently employing metric logs and event logs is presented. The method includes concurrently modeling multivariate metric series and individual events in event series by a multi-stream recurrent neural network (RNN) to improve prediction of future metrics, where the multi-stream RNN includes a series of RNNs, one RNN for each metric and one RNN for each event sequence and modeling causality relations between the multivariate metric series and the individual events in the event series by employing an attention mechanism to identify target events most responsible for fluctuations of one or more target metrics.