The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Jul. 11, 2018
Applicant:

Fujifilm Electronic Materials U.s.a., Inc., N. Kingstown, RI (US);

Inventors:

Sanjay Malik, Attleboro, MA (US);

Raj Sakamuri, Sharon, MA (US);

Ognian N. Dimov, Warwick, RI (US);

Binod B. De, Attleboro, MA (US);

William A. Reinerth, Riverside, RI (US);

Ahmad A. Naiini, East Greenwich, RI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/037 (2006.01); G03F 7/038 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03C 1/805 (2006.01); G03F 7/34 (2006.01); B29C 67/00 (2017.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); C09D 179/08 (2006.01); C08G 73/10 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0387 (2013.01); B29C 67/00 (2013.01); C08G 73/1014 (2013.01); C08G 73/1039 (2013.01); C08G 73/1042 (2013.01); C08G 73/1046 (2013.01); C08G 73/1067 (2013.01); C09D 179/08 (2013.01); G03C 1/805 (2013.01); G03F 7/037 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/325 (2013.01); G03F 7/343 (2013.01); H01L 21/0273 (2013.01); H01L 21/02118 (2013.01); H01L 21/311 (2013.01);
Abstract

This disclosure relates to a photosensitive composition that includes at least one fully imidized polyimide polymer having a weight average molecular weight in the range of about 20,000 Daltons to about 70,000 Daltons; at least one solubility switching compound; at least one photoinitiator; and at least one solvent. The composition is capable of forming a film or a dry film having a dissolution rate of greater than about 0.15 micron/second using cyclopentanone as a developer.


Find Patent Forward Citations

Loading…