The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Jul. 12, 2019
Osaka University, Suita, JP;
Daikin Industries, Ltd., Osaka, JP;
Akihiro Oshima, Suita, JP;
Takayuki Tanaka, Osaka, JP;
Hideki Nakaya, Osaka, JP;
Kazuyuki Satoh, Osaka, JP;
Ryosuke Senba, Osaka, JP;
OSAKA UNIVERSITY, Osaka, JP;
DAIKIN INDUSTRIES, LTD., Osaka, JP;
Abstract
Provided is a method for producing low-molecular-weight polytetrafluoroethylene which is less likely to generate C6-C14 perfluorocarboxylic acids and salts thereof. The disclosure relates to a method for producing low-molecular-weight polytetrafluoroethylene having a melt viscosity at 380° C. of 1.0×10to 7.0×10Pa·s. The method includes (1) irradiating high-molecular-weight polytetrafluoroethylene with radiation in a substantially oxygen-free state and decomposing the high-molecular-weight polytetrafluoroethylene into a low-molecular-weight component and (2) deactivating, in a substantially oxygen-free state, at least part of main-chain radicals and end radicals generated by the irradiation and providing the low-molecular-weight polytetrafluoroethylene.