The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Jul. 08, 2022
Applicant:

Western Digital Technologies, Inc., San Jose, CA (US);

Inventors:

Nattaporn Khamnualthong, Nonthaburi, TH;

Krisda Siangchaew, Siangchaew, TH;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 11/105 (2006.01); G11B 5/00 (2006.01); G11B 5/31 (2006.01); G11B 5/60 (2006.01); G11B 5/39 (2006.01); G11B 13/08 (2006.01); G11B 5/40 (2006.01);
U.S. Cl.
CPC ...
G11B 5/314 (2013.01); G11B 5/3906 (2013.01); G11B 5/40 (2013.01); G11B 5/6088 (2013.01); G11B 13/08 (2013.01); G11B 2005/0021 (2013.01);
Abstract

A heat-assisted magnetic recording (HAMR) head has a protective multilayer confined to a window of the disk-facing surface of the slider that surrounds the near-field transducer (NFT) end and write pole end. The protective multilayer is made up of a first film of silicon nitride directly on and in contact with the NFT end and the write pole end and a second film of a metal oxide on and in contact with the silicon nitride film. The silicon nitride film is preferably formed by RIBD but is thin enough so that it does not contain any significant amount of other compounds. The metal oxide is preferably silicon dioxide, or alternatively an oxide of hafnium, tantalum, yttrium or zirconium, and together with the silicon nitride film provides a protective multilayer of sufficient thickness to be optically transparent to radiation and resistant to thermal oxidation.


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