The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Mar. 26, 2021
Applicant:

Oceanit Laboratories, Inc., Honolulu, HI (US);

Inventors:

Christopher Sullivan, Honolulu, HI (US);

Matthew Williams, Honolulu, HI (US);

Matthew Sullivan, Honolulu, HI (US);

Assignee:

Oceanit Laboratories, Inc., Honolulu, HI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/20 (2006.01); G06T 19/20 (2011.01); G06F 18/23 (2023.01); B33Y 80/00 (2015.01);
U.S. Cl.
CPC ...
G06T 17/20 (2013.01); B33Y 80/00 (2014.12); G06F 18/23 (2023.01); G06T 19/20 (2013.01); G06T 2207/30201 (2013.01);
Abstract

The present invention is generally directed to anatomically conforming apparatuses, and the creation, design, and fitting of such apparatuses. In at least one embodiment, the present invention relates to masks that require a conformal fit to a user's face, including, but not limited to, respirator and breathing masks, oxygen masks for both civil and military pilots, ventilation masks used in hazardous environments, and the like. One or more methods for clustering facial scans to design a finite set of mass-producible masks is also described, such that each individual in a given population can be assigned at least one mask in the set of masks that is anatomically conforming to that individual's specific facial geometry. Also described are one or more methods for fitting a face mask to a specific individual based on a 3-D scan of that individual's face.


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