The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Mar. 01, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kevin Laughton Cunningham, Belmont, CA (US);
Manivannan Thothadri, Mountain View, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 33/38 (2006.01); B29C 33/40 (2006.01); B29C 43/02 (2006.01); G03F 7/20 (2006.01); B29C 43/38 (2006.01); B82Y 40/00 (2011.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/3878 (2013.01); B29C 33/40 (2013.01); B29C 43/02 (2013.01); B29C 43/38 (2013.01); B82Y 40/00 (2013.01); G03F 7/2002 (2013.01); G03F 7/30 (2013.01); B29K 2909/02 (2013.01); B29K 2995/0027 (2013.01);
Abstract
Embodiments of the present disclosure generally relate to imprint lithography, and more particularly to methods and apparatus for creating a large area imprint without a seam. Methods disclosed herein generally include separating the curing time of the features in a stamp or product from the curing time of the seam and the periphery. The seam and periphery can be cured first or the seam and periphery can be cured last. Additionally, the seam curing operations can be performed on the master, on the stamp, or on the final product.