The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Sep. 22, 2020
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Amir Tavakkoli Kermani Ghariehali, Austin, TX (US);

Edward Brian Fletcher, Austin, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G06F 30/12 (2020.01); G07F 17/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); G06F 30/12 (2020.01); G07F 17/0014 (2013.01);
Abstract

A system and method of generating a drop pattern. The method may include receiving an initial drop pattern. The method may include receiving a target drop pattern exclusion edge for each of a plurality of locations. The method may include receiving one or more constraints of a dispensing system. The method may include generating a base drop pattern exclusion edge line based on the target drop pattern exclusion edge. The method may include generating a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.


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