The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Aug. 30, 2017
Applicant:
Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno, 's-Gravenhage, NL;
Inventor:
Hamed Sadeghian Marnani, The Hague, NL;
Assignee:
Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO, 's-Gravenhage, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01); G01Q 60/38 (2010.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G01Q 60/38 (2013.01); G01N 2223/07 (2013.01); G01N 2223/507 (2013.01);
Abstract
A method for measuring damage (D) of a substrate () caused by an electron beam (). The method comprises using an atomic force microscope (AFM) to provide a measurement (S) of mechanical and/or chemical material properties (P) of the substrate () at an exposure area () of the electron beam (). The method further comprises calculating a damage parameter (Sd) indicative for the damage (D) based on the measurement (S) of the material properties (P) at the exposure area ().