The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Dec. 26, 2019
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Yasuhiro Uchida, Tokyo, JP;

Koji Kobayashi, Tokyo, JP;

Hiromitsu Ochiai, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); H10K 71/00 (2023.01); H10K 71/16 (2023.01); H10K 50/11 (2023.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); H10K 71/00 (2023.02); H10K 71/166 (2023.02); H10K 50/11 (2023.02); H10K 71/164 (2023.02);
Abstract

A deposition mask includes: a mask body having two or more first through-holes; and a support disposed on the mask body and having a second through-hole located at a position overlapped with the first through-holes in a plan view. The mask body has a first surface located on an opposite side of a side of the support, and a second surface located on the side of the support. An outermost circumference first through-hole, which is located on an outermost circumference in a plan view of the two or more first through-holes located at the position overlapped with the second through-hole in a plan view, includes a first point which is a center of the outermost circumference first through-hole in a plan view; the second through-hole includes a second point on an outline of the second through-hole, the second point being nearest to the first point.


Find Patent Forward Citations

Loading…