The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Jul. 23, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Xi Chen, San Jose, CA (US);
Shreesha Yogish Rao, Milpitas, CA (US);
Sheng Guo, Oakland, CA (US);
Chi H. Ching, Mountain View, CA (US);
Thomas Blasius Brezoczky, Los Gatos, CA (US);
Cheng-Hsiung Tsai, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods of cleaning a substrate support comprise: introducing a cleaning gas into a processing chamber containing the substrate support; applying a radio frequency (RF) power to a remote plasma source that is in fluid communication with the processing chamber to establish a reactive etching plasma from the cleaning gas in the processing chamber; reacting deposits on the substrate support with the reactive etching plasma to form a by-products phase; and evacuating the by-products phase from the processing chamber.