The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Sep. 22, 2020
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Kang Suk Lee, Cheonan-si, KR;

Joo Sung Lee, Cheonan-si, KR;

Soon Kab Kwon, Gimhae-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 12/10 (2006.01); H01L 21/67 (2006.01); B05B 12/12 (2006.01); B08B 3/08 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
B05B 12/10 (2013.01); B05B 12/12 (2013.01); B08B 3/08 (2013.01); H01L 21/02057 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 21/67248 (2013.01); H01L 21/67017 (2013.01);
Abstract

Disclosed is an apparatus for treating a substrate. The apparatus includes a substrate support unit that supports the substrate, a nozzle unit that dispenses a treatment liquid onto the substrate supported on the substrate support unit, and a liquid supply unit that supplies the treatment liquid to the nozzle unit. The liquid supply unit includes a main supply line that is connected to the nozzle unit and that supplies the treatment liquid to the nozzle unit, wherein the treatment liquid is prepared by mixing a chemical with DIW at a first temperature and DIW at a second temperature higher than the first temperature, and temperature of the treatment liquid is adjusted by regulating a flow rate of the DIW at the first temperature and a flow rate of the DIW at the second temperature without a separate heater.


Find Patent Forward Citations

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Lee, Kang. (2023). Substrate treating apparatus and treatment liquid dispensing method for controlling a temperature of treatment liquid (U.S. Patent No. 11772115). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11772115

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