The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Sep. 25, 2019
Sekisui Chemical Co., Ltd., Osaka, JP;
Kazuto Natsuyama, Tsukuba, JP;
Kokoro Hamachi, Tsukuba, JP;
SEKISUI CHEMICAL CO., LTD., Osaka, JP;
Abstract
Generation of bubbles in an organic-substance production apparatus is suppressed. A gas treatment method including: an adsorption step of passing a source gas containing at least carbon dioxide and nitrogen through an adsorption unit for adsorbing carbon dioxide to reduce a carbon dioxide concentration in the source gas; a supply step of supplying the source gas whose carbon dioxide concentration has been reduced by the adsorption step to an organic-substance production apparatus; and a monitoring step of monitoring a carbon dioxide concentration and a nitrogen concentration in the source gas; wherein the adsorption step has an ability regulation step of enhancing an ability of the adsorption unit to reduce a carbon dioxide concentration in the source gas, when a total concentration of the carbon dioxide concentration and the nitrogen concentration monitored in the monitoring step exceeds a threshold value.