The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Jul. 12, 2020
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Heonjung Shin, Hwaseong-si, KR;

Jeoungsub Lee, Seoul, KR;

Hyun Joon Oh, Seongnam-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/52 (2006.01); H10K 50/84 (2023.01); G02B 1/14 (2015.01); B32B 27/28 (2006.01); B32B 27/06 (2006.01); B32B 7/12 (2006.01); H10K 59/12 (2023.01); H10K 59/40 (2023.01); H10K 77/10 (2023.01); H10K 102/00 (2023.01);
U.S. Cl.
CPC ...
H10K 50/841 (2023.02); B32B 7/12 (2013.01); B32B 27/06 (2013.01); B32B 27/281 (2013.01); G02B 1/14 (2015.01); H10K 59/12 (2023.02); H10K 59/40 (2023.02); H10K 77/111 (2023.02); B32B 2255/10 (2013.01); B32B 2307/304 (2013.01); B32B 2457/206 (2013.01); H10K 2102/311 (2023.02);
Abstract

A window for a display device includes: a film having flexibility; and at least one coating layer disposed on the film. As tensile stress acting on the film increases, the film is elastically deformed in a first range of strains of the film and plastically deformed in a second range of strains of the film greater than the first range, the first and second ranges being defined by a relationship between the tensile stress and a strain of the film in accordance with the tensile stress. The film has a yield strain in a third range from about 1.9% to about 2.25%, and the yield strain is defined as the strain of the film when a yield stress of the relationship in the first range is applied to the film.


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