The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Aug. 14, 2020
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sunil Shim, Seoul, KR;

Suhyeong Lee, Suwon-si, KR;

Taisoo Lim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01); H10B 41/27 (2023.01); H10B 41/35 (2023.01); H10B 43/35 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H01L 29/40114 (2019.08); H01L 29/40117 (2019.08); H01L 29/4234 (2013.01); H01L 29/42324 (2013.01); H10B 41/27 (2023.02); H10B 41/35 (2023.02); H10B 43/35 (2023.02);
Abstract

A semiconductor device includes gate layers stacked on a substrate in a first direction perpendicular to an upper surface of the substrate, and channel structures penetrating the gate layers and extending in the first direction, each of the channel structures includes first dielectric layers on side surfaces of the gate layers, respectively, and spaced apart from each other in the first direction, electric charge storage layers on side surfaces of the first dielectric layers, respectively, and spaced apart from each other in the first direction, a second dielectric layer extending perpendicularly to the substrate to conform to side surfaces of the electric change storage layers, and a channel layer extending perpendicularly, and each of the first dielectric layers has a first maximum length, and each of the electric charge storage layers has a second maximum length greater than the first maximum length in the first direction.


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