The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Oct. 27, 2021
Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Ji Young Byun, Seoul, KR;

Kwang-Deok Choi, Seoul, KR;

Honguk Cheon, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 3/38 (2006.01); C23C 18/18 (2006.01); C23C 18/31 (2006.01); C23C 28/02 (2006.01); C23F 1/02 (2006.01); C23F 17/00 (2006.01); C25D 5/34 (2006.01); C25D 5/48 (2006.01); H05K 3/06 (2006.01); H05K 3/10 (2006.01); H05K 1/03 (2006.01); H05K 1/09 (2006.01);
U.S. Cl.
CPC ...
H05K 3/388 (2013.01); C23C 18/1817 (2013.01); C23C 18/31 (2013.01); C23C 28/023 (2013.01); C23F 1/02 (2013.01); C23F 17/00 (2013.01); C25D 5/34 (2013.01); C25D 5/48 (2013.01); H05K 3/06 (2013.01); H05K 3/108 (2013.01); H05K 3/382 (2013.01); H05K 1/0306 (2013.01); H05K 1/09 (2013.01); H05K 2201/083 (2013.01); H05K 2203/072 (2013.01); H05K 2203/0723 (2013.01);
Abstract

Provided is a method for manufacturing a circuit board including: (a) preparing a mixture of a metal powder, an anti-sintering agent, and an activator; (b) immersing a dielectric substrate in the mixture; (c) forming a metal-containing layer on the surface of the dielectric substrate by heating the mixture under an inert atmosphere or under a reducing atmosphere; (d) forming a first metal layer on the metal-containing layer by electroless plating and forming a second metal layer thereon by electroplating; and (e) forming a metal pattern on the dielectric substrate, wherein the first metal layer includes Cu, Ni, Co, Au, Pd, or an alloy thereof, the second metal layer includes Cu, Ni, Fe, Co, Cr, Zn, Au, Ag, Pt, Pd, Rh, or an alloy thereof, and the method further includes performing heat treatment at least once after step (c).


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