The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Feb. 08, 2022
Applicant:

3-5 Power Electronics Gmbh, Dresden, DE;

Inventors:

Jens Kowalsky, Storkow, DE;

Volker Dudek, Ettlingen, DE;

Riteshkumar Bhojani, Chemnitz, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/868 (2006.01); H01L 29/861 (2006.01); H01L 29/06 (2006.01); H01L 29/20 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/861 (2013.01); H01L 29/06 (2013.01); H01L 29/20 (2013.01); H01L 29/66204 (2013.01);
Abstract

A stacked III-V semiconductor diode comprising or consisting of GaAs with a highly n-doped cathode layer, a highly p-doped anode layer and a drift region arranged between the cathode layer and the anode layer, wherein the drift region has a low n-doped drift layer and a low p-doped drift layer, the n-doped drift layer is arranged between the p-doped drift layer and the cathode layer, both drift layers each have a layer thickness of at least 5 μm and, along the respective layer thickness, have a dopant concentration maximum of not more than 8·10cm, the dopant concentration maxima of the two drift layers have a ratio of 0.1 to 10 to each other and a ratio of the layer thickness of the n-doped drift layer to the layer thickness of the p-doped drift layer is between 0.5 and 3.


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