The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2023
Filed:
Sep. 01, 2020
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventor:
Takeshi Higuchi, Kanagawa, JP;
Assignee:
Kioxia Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); G03F 7/0002 (2013.01); Y10T 428/24628 (2015.01);
Abstract
According to one embodiment, a template for nanoimprint lithography includes a substrate having a main surface and a mesa structure on the main surface. The mesa structure has an upper surface that can be patterned with recesses or the like. A film containing a quantum dot or quantum dots is on the main surface other than the upper surface of the mesa structure. The quantum dot can absorb ultraviolet light and emit visible light.
Higuchi, Takeshi. (2023). Template, method for producing template, and method for producing semiconductor device (U.S. Patent No. 11769667). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11769667
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile