The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2023
Filed:
Jun. 28, 2019
Baidu Usa, Llc, Sunnyvale, CA (US);
Jianyu Wang, Santa Clara, CA (US);
Haichao Zhang, Sunnyvale, CA (US);
Baidu USA LLC, Sunnyvale, CA (US);
Abstract
Described herein are embodiments for fast training of adversarially robust models against adversarial attacks. Embodiments for model training by perturbing both the image and the label, which may be referred to as Bilateral Adversarial Training (BAT), are disclosed. To generate the adversarial label, one or more closed-form heuristic solutions are derived. One-step targeted attack is used with the target label being the most confusing class. It is shown in various experiments that random start and the most confusing target attack effectively prevent the label leaking and gradient masking problem. Coupled with the adversarial label part, embodiments of presented models significantly improve the state-of-the-art results. Experiments on one or more computationally challenging dataset also demonstrate the effectiveness of the presented BAT method embodiments.
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