The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Nov. 14, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Weichen Wang, Cary, NC (US);

Eliza Salkeld, Raleigh, NC (US);

Shanna Hayes, Cary, NC (US);

Shuyan Lu, Durham, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 18/2415 (2023.01); G06N 20/00 (2019.01); G06N 5/04 (2023.01);
U.S. Cl.
CPC ...
G06F 18/2415 (2023.01); G06N 5/04 (2013.01); G06N 20/00 (2019.01);
Abstract

A detection modeling system performs a distribution analysis to alert to model degradation. The detection modeling system may have a distribution analysis module configured to perform an alerting process in conjunction with a processing device. The distribution analysis module may select, by the processing device, model metrics for analysis, the model metrics being a measure of a parameter associated with the analytical model and determine normal distributions for model metric results for each of the selected model metrics. The detection modeling system may further receive model metric values for each of the selected model metric, compare, by the processing device, the model metric values to the normal distributions for model metric results for each of the received model metric value, and alert, by the processing device, to model degradation of the analytical model based on the comparison of the model metric values to the normal distributions for model metric results.


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