The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Apr. 05, 2018
Applicant:

The School Corporation Kansai University, Suita, JP;

Inventor:

Hideya Kawasaki, Suita, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 9/24 (2006.01); B22F 1/054 (2022.01); B22F 1/0545 (2022.01); B22F 1/052 (2022.01); B22F 1/102 (2022.01); C09D 11/52 (2014.01); C09D 11/037 (2014.01); B22F 1/103 (2022.01);
U.S. Cl.
CPC ...
C09D 11/52 (2013.01); B22F 1/052 (2022.01); B22F 1/054 (2022.01); B22F 1/0545 (2022.01); B22F 1/102 (2022.01); B22F 1/103 (2022.01); B22F 9/24 (2013.01); C09D 11/037 (2013.01); B22F 2301/10 (2013.01);
Abstract

A copper particle mixture ensures suppression of copper oxidation and high dispersibility, and that can be sintered at a low temperature in a short period of time can suitably be used for a conductive copper ink material. The copper particle mixture contains copper fine particle A and copper nanoparticle B, the copper fine particle A having an average particle diameter of 0.1 μm to 5 μm, and being coated with at least one dicarboxylic acid selected from the group consisting of malonic acid and oxalic acid, the copper nanoparticle B comprising a central portion comprising a copper single crystal, and a protective layer surrounding the central portion, and having an average particle diameter of 1 nm to 100 nm, and the protective layer of the copper nanoparticle B containing at least one member selected from the group consisting of Cprimary alcohols, Csecondary alcohols, and derivatives thereof.


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