The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Nov. 25, 2019
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Ki Sang Eum, Chungcheongnam-do, KR;

Byoung Ok Kim, Chungcheongbuk-do, KR;

Jae Hun Jeong, Chungcheongnam-do, KR;

Ju Eun Kim, Chungcheongnam-do, KR;

Jun Ho Seo, Seoul, KR;

Man Kyu Kang, Chungcheongnam-do, KR;

Assignee:

Semes Co., Ltd., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B25B 11/00 (2006.01); H01L 21/68 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
B25B 11/005 (2013.01); H01L 21/68 (2013.01); H01L 21/6838 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01L 2221/68309 (2013.01);
Abstract

A substrate treatment apparatus is provided. The substrate treatment apparatus includes a substrate support part provided with a seating surface and configured to support a substrate, a guide ring annularly disposed along an edge of the substrate support part to surround the substrate, and a centering part provided inside the guide ring and configured to center the substrate by moving in a direction parallel to the seating surface to pressurize the edge of the substrate.


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