The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Apr. 06, 2020
Applicant:

National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);

Inventors:

Charles A. Walker, Albuquerque, NM (US);

Peter D. D. Schwindt, Albuquerque, NM (US);

Grant Biedermann, Albuquerque, NM (US);

Dennis J. De Smet, Bosque Farms, NM (US);

Jongmin Lee, Albuquerque, NM (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 3/00 (2006.01); B01J 3/03 (2006.01); C03C 3/12 (2006.01); F04D 19/04 (2006.01); F16J 12/00 (2006.01); G02B 1/11 (2015.01);
U.S. Cl.
CPC ...
B01J 3/006 (2013.01); B01J 3/004 (2013.01); B01J 3/03 (2013.01); C03C 3/125 (2013.01); F04D 19/04 (2013.01); F16J 12/00 (2013.01); G02B 1/11 (2013.01);
Abstract

A sealed, passively pumped, polycrystalline ceramic vacuum chamber and method for fabricating the chamber are disclosed. The body of the vacuum chamber is made from a polycrystalline ceramic, for example, alumina. The vacuum chamber includes one or more windows made from a transparent ceramic, for example, sapphire, to accommodate optical access, while remaining amorphous-glass free to minimize or eliminate helium permeation. The vacuum chamber components are joined via laser welding or furnace brazing and the completed chamber is bakeable at temperatures up to 400° C. The vacuum chamber can operate at high or ultra-high vacuum pressures for an extended period through the use of one or more getter-based pumps. The vacuum chamber may include one or more atomic sources depending upon the application.


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