The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Apr. 14, 2020
Applicant:

Hcc, Inc., Mendota, IL (US);

Inventors:

Jeffrey Harris Maney, Rockford, IL (US);

John Gregorio, Chicago, IL (US);

Assignee:

HCC, INC., Mendota, IL (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A01F 12/44 (2006.01); A01D 41/127 (2006.01); A01D 75/28 (2006.01); G01R 33/07 (2006.01); H04L 12/40 (2006.01); G05D 1/00 (2006.01);
U.S. Cl.
CPC ...
A01F 12/448 (2013.01); A01D 41/1276 (2013.01); A01D 75/282 (2013.01); G01R 33/072 (2013.01); G05D 1/0022 (2013.01); G05D 2201/0201 (2013.01); H04L 12/40 (2013.01); H04L 2012/40215 (2013.01);
Abstract

A louver position sensing system for a sieve and chaffer of a combine harvester. One system provides that at least one sensor is in actual, physical contact with one or more louvers of the sieve and chaffer. Another system provides that a one or more magnet holders are mounted on louvers and, spaced away, sensors sense magnets in the magnet holders to determine the rotational position of the louvers. Either system allows for accurate, on-the-fly adjustment of the louvers in order to maximize the efficiency of operation of the sieve and chaffer. Preferably, the sensing systems are configured such that sensed position of the louvers is broadcast on the CAN bus of the combine harvester. As a result, the position information can be used to dynamically adjust the openings between the louvers of the sieve and chaffer to achieve more efficient grain cleaning as the machine and field variables change.


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