The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2023
Filed:
Sep. 01, 2021
Applicant:
Marvell Asia Pte Ltd, Singapore, SG;
Inventors:
Shaowu Huang, Sunnyvale, CA (US);
Dance Wu, Palo Alto, CA (US);
Assignee:
MARVELL ASIA PTE LTD, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/02 (2006.01); H05K 3/46 (2006.01); H05K 1/11 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0298 (2013.01); H05K 1/0225 (2013.01); H05K 1/0287 (2013.01); H05K 1/111 (2013.01); H05K 3/4644 (2013.01); H05K 2201/09681 (2013.01);
Abstract
Electronic apparatus includes a dielectric substrate and alternating layers of conducting and dielectric materials disposed over the dielectric substrate, including at least first and second patterned layers of the conducting material separated by an intervening layer of the dielectric material. A conductive trace is disposed within the first patterned layer of the conducting material. A conductive mesh extends within the second patterned layer of the conducting material over a region that overlaps transversely with at least a part of the conductive trace in the first patterned layer.