The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2023
Filed:
May. 24, 2021
Applicant:
Che Inc., Kaohsiung, TW;
Inventors:
Chuan-Pu Liu, Tainan, TW;
Yin-Wei Cheng, Kaohsiung, TW;
Shih-An Wang, Taipei, TW;
Bo-Liang Peng, Kaohsiung, TW;
Chun-Hung Chen, New Taipei, TW;
Jun-Han Huang, Changhua County, TW;
Yi-Chang Li, Changhua, TW;
Assignee:
CHE Inc., Kaohsiung, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02282 (2013.01); H01L 21/0245 (2013.01); H01L 21/02428 (2013.01); H01L 21/02532 (2013.01); H01L 21/02601 (2013.01);
Abstract
A method of forming a structure having a coating layer includes the following steps: providing a substrate; coating a fluid on the surface of the substrate, where the fluid includes a carrier and a plurality of silicon-containing nanoparticles; and performing a heating process to remove the carrier and convert the silicon-containing nanoparticles into a silicon-containing layer, a silicide layer, or a stack layer including the silicide layer and the silicon-containing layer.