The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Sep. 27, 2021
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Keqing Liang, Cupertino, CA (US);

Giorgio Paolo Martini, Redwood City, CA (US);

Shan Zhou, Cupertino, CA (US);

Linda Fayad, San Francisco, CA (US);

Wen Pu, Santa Clara, CA (US);

Austin Qingfeng Lu, Sunnyvale, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06Q 10/1053 (2023.01); G06F 3/14 (2006.01); G06N 5/022 (2023.01); G06F 16/2457 (2019.01);
U.S. Cl.
CPC ...
G06Q 10/1053 (2013.01); G06F 3/14 (2013.01); G06F 16/24578 (2019.01); G06N 5/022 (2013.01);
Abstract

Sponsored and organic pieces of content are displayed in accordance with a blending model that is used to first identify a pattern of slots to which to assign either sponsored or organic pieces of content. This blending model is applied to a combination of both sponsored and non-sponsored pieces of content being considered for display to a user. This pattern only determines the slot assignments. The actual ranking of the pieces of content, and more particularly the actual ranking of the organic pieces of content, is determined by an ordering other than the ranking determined by the blending model, such as by using the original ordering of the second list. The pieces of content are then displayed in the order of this actual ranking, but in the slots indicated as having been assigned to be either sponsored or organic in the pattern determined by the blending model.


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