The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Oct. 09, 2018
Applicant:

Samsung Sdi Co., Ltd., Yongin-si, KR;

Inventors:

Jinsuop Youn, Suwon-si, KR;

Misun Kim, Suwon-si, KR;

Hong Jeong Yu, Suwon-si, KR;

Bumjin Lee, Suwon-si, KR;

Yonghee Kang, Suwon-si, KR;

Dongjun Kim, Suwon-si, KR;

Byeonggeun Son, Suwon-si, KR;

Jihyeon Yim, Suwon-si, KR;

Mi Jeong Choi, Suwon-si, KR;

Jonggi Kim, Suwon-si, KR;

Minjee Park, Suwon-si, KR;

Hojeong Paek, Suwon-si, KR;

Woo Jung Shin, Suwon-si, KR;

Young Woong Jang, Suwon-si, KR;

Assignee:

Samsung SDI Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C09K 11/02 (2006.01); C09K 11/88 (2006.01); G03F 7/00 (2006.01); G03F 7/033 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/031 (2006.01); G03F 7/038 (2006.01); G03F 7/027 (2006.01); G03F 7/105 (2006.01); C09D 11/30 (2014.01); B82Y 35/00 (2011.01); B82Y 20/00 (2011.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/0048 (2013.01); C09D 11/30 (2013.01); C09K 11/025 (2013.01); C09K 11/883 (2013.01); G03F 7/0007 (2013.01); G03F 7/0047 (2013.01); G03F 7/027 (2013.01); G03F 7/031 (2013.01); G03F 7/033 (2013.01); G03F 7/038 (2013.01); G03F 7/105 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2002 (2013.01); G03F 7/38 (2013.01); B82Y 20/00 (2013.01); B82Y 30/00 (2013.01); B82Y 35/00 (2013.01);
Abstract

A photosensitive resin composition includes: (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a quantum dot surface-modified with a compound having a thiol group at one terminal end and an alkoxy group, a cycloalkyl group, a carboxyl group, or a hydroxy group at the other terminal end; and (E) a solvent. A curable composition includes: (A') a resin; (B′) a quantum dot surface-modified with a compound represented by Chemical Formula 1 or Chemical Formula 2; and (C′) a solvent. A method of manufacturing the surface-modified quantum dot, and a color filter manufactured using the photosensitive resin composition or the curable composition are also disclosed.


Find Patent Forward Citations

Loading…