The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2023
Filed:
Nov. 15, 2021
Applicant:
Hella Gmbh & Co. Kgaa, Lippstadt, DE;
Inventors:
William Castellon Rivera, Wadersloh, DE;
Benjamin Willeke, Paderborn, DE;
Assignee:
Hella GmbH & Co. KGaA, Lippstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); F21S 41/275 (2018.01); F21V 5/00 (2018.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0012 (2013.01); F21S 41/275 (2018.01); F21V 5/004 (2013.01); G02B 3/0056 (2013.01); G03F 7/70291 (2013.01); H01L 27/14627 (2013.01);
Abstract
A method for producing an aperture array for a microlens array, in particular for a microlens array of a vehicle headlamp, comprising at least the following steps: providing a wafer having a microlens array arranged on a first wafer surface, masking a second wafer surface of the wafer by means of a shadow mask, wherein the shadow mask includes a negative of the aperture array, coating the masked wafer surface with an opaque layer, removing the shadow mask and obtaining the aperture array on the second wafer surface.