The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Jan. 28, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Tooru Inaba, Tokyo, JP;

Ruochi Hsu, Tokyo, JP;

Shinya Matsuoka, Tokyo, JP;

Takeshi Yokokawa, Tokyo, JP;

Daisuke Ebihara, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 35/04 (2006.01);
U.S. Cl.
CPC ...
G01N 35/04 (2013.01); G01N 2035/0477 (2013.01);
Abstract

The objective of the present disclosure is to provide a technique for reducing a quantity of magnetic particles remaining on a reaction vessel wall surface in a cleaning step for reducing, in a stepwise manner, an amount of a magnetic particle solution in the reaction vessel. The automated analysis device according to the present disclosure causes an agitating mechanism to operate in such a way that a magnetic substance remaining on the wall surface of the vessel in the previous cleaning step is captured by a cleaning solution in the next cleaning step.


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