The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Dec. 02, 2016
Applicant:

Atotech Deutschland Gmbh, Berlin, DE;

Inventors:

Andreas Kirbs, Berlin, DE;

Christian Wendeln, Berlin, DE;

Edith Steinhäuser, Berlin, DE;

Sebastian Zarwell, Berlin, DE;

Kevin-Sigurt Gottschalk, Berlin, DE;

Mayumi Nishikido, Berlin, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/40 (2006.01); G01N 27/30 (2006.01); G01N 27/49 (2006.01); C23C 18/16 (2006.01);
U.S. Cl.
CPC ...
C23C 18/1683 (2013.01); C23C 18/405 (2013.01); G01N 27/30 (2013.01); G01N 27/49 (2013.01);
Abstract

The present invention relates to a method for monitoring the total amount of sulphur containing compounds in a metal or metal alloy plating bath, wherein the sulphur containing compounds contain at least one sulphur atom having an oxidation state below +6, the method comprising the steps (a), (b), optionally (c), and (d). Said method is a means of providing control over a metal plating process. Thus, the present invention relates furthermore to a controlled process for plating a metal on a substrate utilizing the method of the present invention for monitoring the total amount of said sulphur containing compounds.


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