The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2023
Filed:
Apr. 06, 2020
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Takashi Fujiwara, Kakegawa, JP;
Atsuhiko Sato, Kakegawa, JP;
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/60 (2006.01); C08G 77/08 (2006.01); C08G 77/24 (2006.01); H01L 21/02 (2006.01); C08G 81/00 (2006.01);
U.S. Cl.
CPC ...
C08G 77/60 (2013.01); C08G 77/08 (2013.01); C08G 77/24 (2013.01); C08G 81/00 (2013.01); H01L 21/02211 (2013.01); H01L 21/02282 (2013.01); C08G 2150/00 (2013.01);
Abstract
To provide a siliceous film manufacturing composition that can fill a narrow and a high aspect ratio trench and can produce a thick siliceous film. [Means for Solution] The present invention provides a siliceous film manufacturing composition that comprises, (a) a block copolymer having a linear and/or cyclic polysilane backbone block with or more silicon atoms and a polycarbosilane backbone block with or more silicon atoms, and (b) a solvent.