The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2023
Filed:
Oct. 02, 2018
Applicant:
Coorstek Kk, Tokyo, JP;
Inventors:
Sayuki Yoshida, Aichi, JP;
Yukihisa Miyashita, Aichi, JP;
Assignee:
CoorsTek KK, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/119 (2006.01); C04B 41/00 (2006.01); C04B 35/64 (2006.01); C04B 35/626 (2006.01);
U.S. Cl.
CPC ...
C04B 35/119 (2013.01); C04B 35/62695 (2013.01); C04B 35/64 (2013.01); C04B 41/009 (2013.01); C04B 2235/3201 (2013.01); C04B 2235/3206 (2013.01); C04B 2235/3208 (2013.01); C04B 2235/3217 (2013.01); C04B 2235/3225 (2013.01); C04B 2235/3244 (2013.01); C04B 2235/3418 (2013.01); C04B 2235/656 (2013.01); C04B 2235/6582 (2013.01); C04B 2235/786 (2013.01);
Abstract
The present invention relates to an alumina sintered body and a manufacturing method therefor; for example, the present invention relates to an alumina sintered body that is suitably utilized for a member or similar used in a plasma processing device, an etcher for semiconductor/liquid crystal display device manufacturing, a CVD device, or similar, or that is suitably utilized for a substrate or similar of a plasma-resistant member which is to be coated, as well as a manufacturing method for said alumina sintered body.