The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Oct. 26, 2021
Applicants:

SK Hynix Inc., Gyeonggi-do, KR;

Ewha University—industry Collaboration Foundation, Seoul, KR;

Inventors:

Sehyuk Ahn, Gyeonggi-do, KR;

Chanhyuk Park, Seoul, KR;

Soyoun Kim, Seoul, KR;

Minju Cha, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 61/02 (2006.01); B01D 69/02 (2006.01); B01D 71/02 (2006.01); C02F 1/44 (2023.01); C02F 101/16 (2006.01); C02F 103/34 (2006.01); C02F 9/00 (2023.01); C02F 101/14 (2006.01); C02F 3/12 (2023.01); C02F 3/28 (2023.01);
U.S. Cl.
CPC ...
C02F 9/00 (2013.01); B01D 61/027 (2013.01); B01D 69/02 (2013.01); B01D 71/021 (2013.01); B01D 71/024 (2013.01); B01D 2311/2688 (2013.01); B01D 2325/02 (2013.01); B01D 2325/14 (2013.01); C02F 1/442 (2013.01); C02F 3/1236 (2013.01); C02F 3/28 (2013.01); C02F 2101/14 (2013.01); C02F 2101/16 (2013.01); C02F 2103/346 (2013.01); C02F 2301/046 (2013.01); C02F 2301/08 (2013.01);
Abstract

A semiconductor process wastewater treatment system and a semiconductor process wastewater treatment method using the same are disclosed. The disclosed semiconductor process wastewater treatment system may comprises: a processing unit configured to receive semiconductor process wastewater and treats the semiconductor process wastewater through a plurality of operations; and a membrane filtration tank arranged separately from the processing unit, the membrane filtration tank having a ceramic nano-membrane for filtering the semiconductor process wastewater which has passed through the processing unit, wherein the ceramic nano-membrane may include a carbon-based nano-material. The ceramic nano-membrane may include a graphene-based nano-material as the carbon-based nano-material.


Find Patent Forward Citations

Loading…