The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2023
Filed:
Dec. 04, 2020
Vesuvius U S a Corporation, Champaign, IL (US);
Bedadibhas Mohanty, Cranberry Township, PA (US);
David R. Self, Massillon, OH (US);
VESUVIUS USA CORPORATION, Champaign, IL (US);
Abstract
A device and a process for the continuous application of a refractory slurry to a surface incorporate a batch reactor () for the controlled mixing of the slurry, a product vessel () in communication with the batch reactor () to contain the mixed slurry, and a variable-rate spraying applicator or nozzle in communication with the product vessel and with an air supply. A controller () controls input to, output from, and the operation of, the batch mixer (), and monitors batch production. The controller () monitors the amount of slurry contained in the product vessel (). If the level of slurry in the product hopper is such that the product hopper cannot accommodate an additional batch of slurry, the controller interrupts batch production and resumes production when the product hopper can accept the contents of the batch reactor ().